DUGiDocsMolecular hydrogen diffusion in nanostructured amorphous silicon thin films
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dc.date.accessioned
2013-11-12T16:44:07Z
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2013-11-12T16:44:07Z
dc.date.issued
2009
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1098-0121
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dc.description.abstract
We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data
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application/pdf
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eng
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American Physical Society
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Reproducció digital del document publicat a: http://dx.doi.org/10.1103/PhysRevB.80.073202
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© Physical Review B, 2009, vol. 80, núm. 7, p. 073202
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Articles publicats (D-F)
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Tots els drets reservats
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dc.title
Molecular hydrogen diffusion in nanostructured amorphous silicon thin films
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info:eu-repo/semantics/article
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info:eu-repo/semantics/openAccess
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Cap
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info:eu-repo/semantics/publishedVersion
dc.identifier.doi
dc.identifier.idgrec
012664
dc.identifier.eissn
1550-235X