Calorimetry of hydrogen desorption from ɑ-Si nanoparticles
dc.contributor.author
dc.date.accessioned
2013-04-09T09:53:55Z
dc.date.available
2013-04-09T09:53:55Z
dc.date.issued
2002
dc.identifier.issn
1098-0121
dc.identifier.uri
dc.description.abstract
The process of hydrogen desorption from amorphous silicon (ɑ-Si) nanoparticles grown by plasmaenhanced chemical vapor deposition (PECVD) has been analyzed by differential scanning calorimetry (DSC), mass spectrometry, and infrared spectroscopy, with the aim of quantifying the energy exchanged. Two exothermic peaks centered at 330 and 410 °C have been detected with energies per H atom of about 50 meV. This value has been compared with the results of theoretical calculations and is found to agree with the dissociation energy of Si-H groups of about 3.25 eV per H atom, provided that the formation energy per dangling bond in ɑ-Si is about 1.15 eV. It is shown that this result is valid for ɑ-Si:H films, too
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application/pdf
dc.language.iso
eng
dc.publisher
American Physical Society
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Reproducció digital del document publicat a: http://dx.doi.org/10.1103/PhysRevB.65.115403
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© Physical Review B, 2002, vol. 65, num. 11, p. 115403-115407
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Articles publicats (D-F)
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Tots els drets reservats
dc.subject
dc.title
Calorimetry of hydrogen desorption from ɑ-Si nanoparticles
dc.type
info:eu-repo/semantics/article
dc.rights.accessRights
info:eu-repo/semantics/openAccess
dc.embargo.terms
Cap
dc.type.version
info:eu-repo/semantics/publishedVersion
dc.identifier.doi
dc.identifier.idgrec
002912
dc.identifier.eissn
1550-235X