Molecular hydrogen diffusion in nanostructured amorphous silicon thin films
dc.contributor.author
dc.date.accessioned
2013-11-12T16:44:07Z
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2013-11-12T16:44:07Z
dc.date.issued
2009
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1098-0121
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dc.description.abstract
We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data
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application/pdf
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eng
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American Physical Society
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Reproducció digital del document publicat a: http://dx.doi.org/10.1103/PhysRevB.80.073202
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© Physical Review B, 2009, vol. 80, núm. 7, p. 073202
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Articles publicats (D-F)
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Tots els drets reservats
dc.subject
dc.title
Molecular hydrogen diffusion in nanostructured amorphous silicon thin films
dc.type
info:eu-repo/semantics/article
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info:eu-repo/semantics/openAccess
dc.embargo.terms
Cap
dc.type.version
info:eu-repo/semantics/publishedVersion
dc.identifier.doi
dc.identifier.idgrec
012664
dc.identifier.eissn
1550-235X